Five Billion Pulses Later: What DUV Optics Testing Reveals About Semiconductor Tool Uptime

<p><em>By Dr. Sabina Kuprėnaitė</em></p> <p>Deep-ultraviolet optics used in semiconductor lithography may be exposed to billions of pulses over their service life. That creates a qualification challenge that initial reflectance specifications or laser-induced damage thresholds alone cannot answer.</p> <p>A mirror may meet its optical specification&#8230; <a href="https://semiwiki.com/lithography/372789-five-billion-pulses-later-what-duv-optics-testing-reveals-about-semiconductor-tool-uptime/" class="read-more">Read More </a></p> <p>The post <a href="https://semiwiki.com/lithography/372789-five-billion-pulses-later-what-duv-optics-testing-reveals-about-semiconductor-tool-uptime/">Five Billion Pulses Later: What DUV Optics Testing Reveals About Semiconductor Tool Uptime</a> appeared first on <a href="https://semiwiki.com">SemiWiki</a>.</p>