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Digitimes September 8, 2026 By DIGITIMES neutral

TSMC, ASML target 12-inch photomask pilot line by 2031, production by 2033

TSMCASMLManufacturingSupply Chain
TSMC and ASML have formed an industry-wide initiative to move extreme ultraviolet lithography from 6-inch photomasks to 12-inch formats, with a pilot mask line targeted for 2031 and 12-inch High NA systems entering advanced-node production by 2033.
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