Molybdenum Quasi Phase-Only Masks Improve EUV Imaging (NYCU, TSMC)
<p>Researchers at National Yang Ming Chiao Tung University and TSMC published a technical paper titled “High contrast EUV imaging enabled by topological quasi phase-only masks.” Abstract Excerpt: “Here, we propose a paradigm shift in EUV PSM technology by introducing molybdenum (Mo)-based quasi phase-only masks (quasi-POMs) with high reflectivity and minimal absorption. Through rigorous electromagnetic simulations,... <a class="read_more" href="https://semiengineering.com/molybdenum-quasi-phase-only-masks-improve-euv-imaging-nycu-tsmc/">» read more</a></p>
<p>The post <a href="https://semiengineering.com/molybdenum-quasi-phase-only-masks-improve-euv-imaging-nycu-tsmc/">Molybdenum Quasi Phase-Only Masks Improve EUV Imaging (NYCU, TSMC)</a> appeared first on <a href="https://semiengineering.com">Semiconductor Engineering</a>.</p>
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