Imec demoes 22nm pitch on single-print high-NA step
<p>Imec has demonstrated the feasibility of patterning tight-pitch random logic structures after a CAR-based single-print High NA EUV lithography step. Logic structures include lines/spaces down to 22nm pitch, and vias […]</p>
<p>The post <a href="https://www.electronicsweekly.com/news/business/imec-demoes-22nm-pitch-and-28nm-vias-on-single-print-high-na-step-2026-09/">Imec demoes 22nm pitch on single-print high-NA step</a> appeared first on <a href="https://www.electronicsweekly.com">Electronics Weekly</a>.</p>
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