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Digitimes September 17, 2026 By Levi Li positive

Exclusive: China's CAS institute charts DUV route to 3nm GAA without EUV

SemiconductorsManufacturing
China's advanced semiconductor research has reached another milestone. The Institute of Microelectronics of the Chinese Academy of Sciences has established a gate-all-around (GAA) device development path for advanced process nodes below 3nm that does not rely on extreme ultraviolet (EUV) lithography as its core technology.
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