ASM Launches Breakthrough Flowable Carbon Technology for the Next Era of Semiconductor Scaling

<p>ASM, a materials discovery company and global leader in semiconductor wafer processing equipment, building on its leadership in atomic layer deposition and epitaxy, launches its XP8 Vertos Flowable Carbon, the market's first plasma-enhanced chemical vapor deposition (PECVD) flowable carbon film.</p> <p>The post <a href="https://www.semiconductor-digest.com/asm-launches-breakthrough-flowable-carbon-technology-for-the-next-era-of-semiconductor-scaling/">ASM Launches Breakthrough Flowable Carbon Technology for the Next Era of Semiconductor Scaling</a> appeared first on <a href="https://www.semiconductor-digest.com">Semiconductor Digest</a>.</p>