Hyper-NA EUV: The Next Extension Beyond High NA Lithography (Carl Zeiss, ASML)
<p>Researchers at Carl Zeiss SMT and ASML published a technical paper titled “Hyper-NA: a system with a numerical aperture of at least 0.75.” Abstract Summary: The researchers examine Hyper-NA EUV lithography with a numerical aperture of at least 0.75 as a path beyond current 0.55-NA High-NA systems, including the optical architecture, resolution potential, reticle 3D... <a class="read_more" href="https://semiengineering.com/hyper-na-euv-the-next-extension-beyond-high-na-lithography-carl-zeiss-asml/">» read more</a></p>
<p>The post <a href="https://semiengineering.com/hyper-na-euv-the-next-extension-beyond-high-na-lithography-carl-zeiss-asml/">Hyper-NA EUV: The Next Extension Beyond High NA Lithography (Carl Zeiss, ASML)</a> appeared first on <a href="https://semiengineering.com">Semiconductor Engineering</a>.</p>
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