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Digitimes October 12, 2026 By Levi Li neutral

TSMC, ASML eye 12-inch photomasks to unlock High-NA EUV's full-field potential

TSMCASMLSemiconductorsManufacturing
Advanced semiconductor manufacturing is progressing toward 2nm and angstrom-era nodes (Å; where 1 nm equals 10 Å), bringing high-numerical-aperture extreme ultraviolet (High-NA EUV) lithography into focus.
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