Siemens transforms computational lithography for next-generation AI semiconductors with NVIDIA cuLitho
Collaboration between Siemens and NVIDIA delivers up to 12x acceleration for full-chip optical proximity correction (OPC) workloads in lithography Enables practical full-chip optimization of photomasks for High Numerical Aperture Extreme Ultraviolet EUV lithography (High-NA EUV) lithography using the most advanced computational lithographic methods, including inverse lithography technology (ILT) Addresses the critical runtime and complexity challenges […]
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