China's 90%-localized EUV light source debuts at 15W, exposing the gap to commercial chipmaking
Chinese semiconductor technology start-up Langdao Silex (Shanghai) Technology has publicly unveiled an extreme ultraviolet (EUV) light source prototype with a claimed 90% localization rate, marking progress in China's efforts to develop domestic lithography technology. However, the system remains three to five years from mass production, with output power and long-term stability posing major engineering challenges.
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