More Pumping Speed, Same Footprint: Edwards Previews Its Next-Gen Turbopumps
<p>By PETE SINGER, Editor-in-Chief, Semiconductor Digest As device architectures grow more three-dimensional, the turbomolecular pumps that clear etch byproducts from process chambers have to move faster. Dawn Stephenson, business development manager, chamber solutions, at Edwards Vacuum, said her team has pushed turbopump speeds past 5,000 liters per second, with 7,000 next, without growing the pump’s…</p>
<p>The post <a href="https://www.semiconductor-digest.com/more-pumping-speed-same-footprint-edwards-previews-its-next-gen-turbopumps/">More Pumping Speed, Same Footprint: Edwards Previews Its Next-Gen Turbopumps</a> appeared first on <a href="https://www.semiconductor-digest.com">Semiconductor Digest</a>.</p>
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