Optimized E-Beam Evaporation Reduces Metal-Semiconductor Contact Degradation (RWTH Aachen)
<p>Researchers at RWTH Aachen University published “Mitigating the degradation of metal–semiconductor contacts with optimized electron beam evaporation.” Abstract “An optimized electron beam evaporation (EBE) setup is presented that allows the suppression of charged particle bombardment of 4” semiconductor samples during metal coating. In-situ measurements of charge carrier flux for different tool configurations are carried out.... <a class="read_more" href="https://semiengineering.com/optimized-e-beam-evaporation-reduces-metal-semiconductor-contact-degradation-rwth-aachen/">» read more</a></p>
<p>The post <a href="https://semiengineering.com/optimized-e-beam-evaporation-reduces-metal-semiconductor-contact-degradation-rwth-aachen/">Optimized E-Beam Evaporation Reduces Metal-Semiconductor Contact Degradation (RWTH Aachen)</a> appeared first on <a href="https://semiengineering.com">Semiconductor Engineering</a>.</p>
Read original article ↗
Related Articles
MetaX-UBTech robot chip venture Xilect raises CNY500 million to take on Nvidia Thor
Xilect, a robot-chip venture set up by Chinese GPU designer MetaX and humanoid robot maker UBTech Robotics, has complete
The OpenAI board member who fired Sam Altman says we still can’t trust AI CEOs
Today, I’m talking with Helen Toner, the executive director of the Center for Security and Emerging Technology at George