Commentary: China IC design rules reshape patent battles

<p class="P1" data-sourcepos="5:1-5:421;116-536">China's State Council has released a revised version of the regulations on the protection of IC layout designs, set to take effect on October 15, 2026. It is the first full overhaul since the rules were issued in 2001, adding protection for photonic and quantum IC designs, increasing punitive damages for intentional infringement, and improving systems for layout design registration, licensing, and rights enforcement.