Beyond ASML: China rethinks EUV race with light-source strategy
China is trying to broaden the definition of the extreme ultraviolet (EUV) race. Rather than focusing only on building a domestic equivalent to ASML's lithography platform, Chinese researchers are exploring alternative EUV light sources that could improve energy efficiency, support semiconductor metrology and eventually provide new options for advanced lithography.
Read original article ↗
Related Articles
Dutch PM presses US to avoid tighter ASML China curbs
Dutch Prime Minister Rob Jetten is pressing Washington to avoid another round of export restrictions on ASML's China bus
ASML says it sold 'absolutely nothing' in Europe in 2026
ASML calls EU authorities to help create demand for European chips as Europe's share in its revenue drops to 0% in 2026.
ASML, TSMC to advance transition to large-format EUV photomasks
While High NA EUV will be adopted for production using the current 6-inch masks, the transition to larger, 12-inch masks
ASML system sales in Europe remain at zero as EU debates Chips Act 2.0
European Union industry ministers are set to debate the proposed Chips Act 2.0 in Brussels on September 24, days after a