ASML unveils Hyper NA EUV successor targeting 5nm single exposure
Engineers from ASML and its optical partner Zeiss have jointly published a research paper in the October issue of the academic journal <em>Journal of Micro/Nanopatterning, Materials and Metrology</em>, formally disclosing "Hyper NA EUV"—the next-generation successor to current high-numerical-aperture extreme ultraviolet (High-NA EUV) lithography systems.
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