Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)
<p>Researchers at Chinese Academy of Sciences, Jilin University, State Key Laboratory of Advanced Manufacturing for Optical Systems, and University of Chinese Academy of Sciences published a technical paper titled “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.” “In this study, we investigate an alternative Pt-W alloy as... <a class="read_more" href="https://semiengineering.com/pt-w-alloy-shows-potential-for-thinner-high-na-euv-mask-absorbers-chinese-academy-of-sciences-et-al/">» read more</a></p>
<p>The post <a href="https://semiengineering.com/pt-w-alloy-shows-potential-for-thinner-high-na-euv-mask-absorbers-chinese-academy-of-sciences-et-al/">Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)</a> appeared first on <a href="https://semiengineering.com">Semiconductor Engineering</a>.</p>
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