Dry-Deposited Resist Shows Different Tone Behavior Under EUV And E-Beam Exposure (KU Leuven, Kunsan, VUB, Imec)

<p>Researchers at KU Leuven, Kunsan National University, Vrije Universiteit Brussel, imec, et al. published “Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resists for Electron-Beam and Extreme Ultraviolet Lithography.” Abstract Excerpt: “Dry-deposited metal–organic resists are key enablers for advanced patterning processes in next-generation semiconductor manufacturing. Here, we report halogenated amorphous zeolitic imidazolate framework... <a class="read_more" href="https://semiengineering.com/dry-deposited-resist-shows-different-tone-behavior-under-euv-and-e-beam-exposure-ku-leuven-kunsan-vub-imec/">&#187; read more</a></p> <p>The post <a href="https://semiengineering.com/dry-deposited-resist-shows-different-tone-behavior-under-euv-and-e-beam-exposure-ku-leuven-kunsan-vub-imec/">Dry-Deposited Resist Shows Different Tone Behavior Under EUV And E-Beam Exposure (KU Leuven, Kunsan, VUB, Imec)</a> appeared first on <a href="https://semiengineering.com">Semiconductor Engineering</a>.</p>